by Gogotsi, Y., Baek, C. and Kirscht, F.
Reference:
Y. Gogotsi, C. Baek, and F. Kirscht, "Raman microspectroscopy study of processing-induced phase transformations and residual stress in silicon", Semiconductor Science and Technology, vol. 14, no. 10, 1999, pp. 936.
Bibtex Entry:
@article{38,
author = {Gogotsi, Y. and Baek, C. and Kirscht, F.},
title = {Raman microspectroscopy study of processing-induced phase transformations and residual stress in silicon},
journal = {Semiconductor Science and Technology},
volume = {14},
number = {10},
pages = {936},
ISSN = {0268-1242},
DOI = {10.1088/0268-1242/14/10/310},
year = {1999},
date= {10/01}
type = {Journal Article},
url = https://nano.materials.drexel.edu/wp-content/papercite-data/pdf/38.pdf
}
Raman microspectroscopy study of processing-induced phase transformations and residual stress in silicon
