Several tube furnaces are available for synthesis of MAX, annealing Mxene, surface functionalization, and ammoniation
Superuser: Christopher, Mikhail
Location: Bossone 327
Purpose: For general MAX phase synthesis
Superuser: Adam, Mikhail
Location: Bossone 327
Purpose: For Ti3AlC2 MAX phases synthesis
Superuser: Mark, Robert
Location: Bossone 324B
Purpose: For ammoniation and salt templated MXene synthesis – N2, Ar, H2/Ar, NH3, Cl2 – 1000 C° max.
Superuser: Christopher, Teng
Location: Bossone 324B
Purpose: For ammoniation and salt templated MXene synthesis – N2, Ar, H2/Ar, NH3, Cl2 – 1000 C° max.
Superuser: Mark, Christopher
Location: Bossone 324B
Purpose: Annealing Mxene samples – inert / reducing atmosphere (N2, Ar, H2/Ar) or rough vacuum – 1000 C° max
Superuser: Mark, Teng
Location: Bossone 324
Purpose: For volatile MAX phases synthesis
Superuser: Mark, Christopher
Location: Bossone 327
Purpose: For surface functionalization of Mxene and direct transfer to glovebox without air exposure.
For various drying purposes. Max temperature is 200C under rough vacuum conditions
Superuser: Kyle, Armin
Location: Bossone 327
Purpose: For drying organic solvent containing materials
Superuser: Geetha, Adam
Location: Bossone 324
Purpose: For drying aqueous based materials
Superuser: Teng, Kyle
Location: Bossone 327
Purpose: For sensitive drying operations such as sample preparation for XPS measurements.
Superuser: Kyle, Kateryna
Location: Bossone 324
Purpose: For routine / dirty drying operations
Superuser: Kyle, Danzhen
Location: Bossone 324
Purpose: For drying glassware and other large parts. Maintained at constant 70 C° at ambient pressure
Superuser: Christopher, Teng
Location: Bossone 324
Purpose: For annealing large dirty parts at up 1500 C° under air / inert atmosphere. May currently have leakage issues
Superuser: Christopher, Teng
Location: Bossone 327A
Purpose: For rapid annealing of large parts at up 1500 C° under air/vacuum.
Superuser: Geetha, Mark
Location: Bossone 327
Purpose: With T-antechamber. #1 contains tube furnace attachment. For annealing and general sample processing. #2 for electrochemical cell assembly – after annealing, electrochemical etching, Li-S batteries.
Superuser: John, Armin
Location: Bossone 323
Purpose: For electrochemical cell assembly
Superuser: Adam, Christopher
Location: Bossone 324A
Purpose: Fully programmable CNC. Used for machining parts and drilling ceramic MAX blocks.
Superuser: Christopher, Teng
Location: Bossone 324A
Purpose: Szegvari Attritor System Type B is used for efficient grinding and mixing of materials
Superuser: Christopher, Teng
Location: Bossone 327
Purpose: Automated mortar and pestle grinder for powders
Superuser: Adam, Christopher
Location: Bossone 327
Purpose: Automated Y-style rotary powder mixer for ball milling.
Superuser: Teng, Geetha
Location: Bossone 324A
Purpose: Automated system for sieving powders with the ability to stack multiple sieves in series.
Superuser: Mikhail, Geetha
Location: Bossone 324
Superuser: Benjamin, Robert
Location: Bossone 323B
Purpose: Used for high speed (up to 15,000 rcf) centrifugation using 6x 50mL tubes
Superuser: Benjamin, Robert
Location: Bossone 324C
Purpose: Used for low speed (up to 5,000 rcf) centrifugation using 4x 200mL bottles
Superuser: Benjamin, Robert
Location: Bossone 327B
Purpose: Used for low speed (up to 5,000 rcf) centrifugation using 4x 500mL bottles, 4x 175mL tubes, 4x 12x 50mL tubes, 4x 12x 15mL tubes
Purpose: For ammoniation and salt templated MXene synthesis – N2, Ar, H2/Ar, NH3, Cl2 – 1000 C max
Superuser: Alex, Adam
Location: Bossone 323B
Purpose: For 16x 1.5mL conical centrifuge tubes
Superuser: Alex, Adam
Location: Bossone 323B
Purpose: For 8x 15mL centrifuge tubes
Superuser: Mikhail, Adam
Location: Bossone 327
Superuser: Adam, Roman
Location: Bossone 323B
Superuser: Alex, Tania
Location: Bossone 324A
Purpose: Probe sonicator for exfoliation, dispersion, and self-assembly of materials. Coupled to recirculator with coolant to maintain low temperatures of dispersion.
Superuser: Eliot, Benjamin
Location: Bossone 324A
Superuser: Robert, Benjamin
Superuser: Christopher, Mikhail
Location: Bossone 327B
Purpose: Custom-designed 1L reactor allows for safe and optimal scale up of Mxene synthesis. Capability to etch / delaminate 100 g batches without changes in material properties compared to traditional small scale methods.
Superuser: Alex, Mikhail
Location: Bossone 324
Superuser: Kyle, Mohit
Location: Bossone 323
Purpose: DRM Flat 100mm RE Rolling Mill has been specifically designed to roll flat metal sheeting exclusively. It is often used to roll the dried electrodes to ensure a good contact between the electrode material and current collector. MXene clays can also be rolled to obtain conductive films directly by squeezing out water.
Superuser: Adam, Lingyi
Location: Bossone 327A
Superuser: Danzen, Teng
Location: Bossone 327A
Purpose: Spin coater (Laurell Technologies Corporation, WS-650Hz-8NPPB) made of Teflon enabling solvent use. Accommodates 8 inch wafer. Max speed 12,000 rpm. It is used for thin film deposition.
Superuser: Benjamin, Roman
Location: Bossone 323B
Purpose: Dedicated fume hood and spray deposition setup for easy and efficient protocol to deposit thin films of materials for various applications.
Superuser: Lingyi, Alex
Location: Bossone 323
Purpose: Electrospinning unit (NEU Kato Tech Co, Ltd.) with a maximum voltage applied of 40 kV.
It is used for fiber fabrication from a polymer-based solution, which are collected continuously on a rotating drum.
Superuser: Alex, Adam
Location: Bossone 324
Superuser: Lingyi, Alex
Location: Bossone 323B
Purpose: Automated preparation of thin samples for adhesive, coating, ink and sealant testing.
Superuser: Ndeye, Geetha
Location: Bossone 323
Purpose: Adjustable Film Coating Applicator Film Coater with Micrometer Wet Film Preparation Device 0-3500μm (150mm). Doctor blade is extensively used for coating battery and supercapacitor electrodes with thickness ranging from a few tens to hundreds of micrometers.
Superuser: Danzhen, Kateryna
Location: Bossone 327A
Purpose: Oxygen and/or Argon Plasma Cleaner (Tergeo Plus Plasma Cleaner, Pie Scientific) with dry pump capable of reaching 200 mTorr or less pump pressure. It is used for substrate cleaning and functionalization.
Superuser: Lingyi, Adam
Location: Bossone 324
Purpose: Axi-draw can move in X-Y directions and can be loaded with Pen to draw or sketch desired patterns. It is a useful tool for direct writing and patterning of functional devices on a wide choice of substrates including paper, glass and plastic.
Superuser: Mark, Teng
Location: Bossone 327
Superuser: Kyle, Alex
Location: Bossone 324
Superuser: Danzhen, Kyle
Location: Bossone 324
Purpose: UV-vis-NIR spectrophotometer (Evolution 201, ThermoScientific) from 190 nm to 1100 nm, optional to attach a potentiostat for in situ photo-electrochemistry experiments. Capability of absorbance and transmission measurements.
Superuser: Tetiana, Lingyi
Location: Bossone 324
Purpose: Dynamic Light Scattering (DLS) (Zetasizer Nano ZS, Malvern Panalytical) equipped with a MP2 Autotitrator. It is used to measure particle size (0.6 nm to 10 um) and zeta potential of colloidal solutions.
Superuser: Eliot, Benjamin
Location: Bossone 324
Superuser: Geetha, John
Location: Bossone 323
Purpose: Arbin BT-2143-11U, College Station, TX, USA is equipped with 32 independent channels and can simultaneously test the electrochemical performance of battery electrodes including galvanostatic charge-discharge, rate handling and cycle life.
Superuser: Danzhen, Kyle
Location: Bossone 327A
Superuser: John, Kyle
Location: Bossone 323
Superuser: Armin, Mohit
Location: Bossone 323
Purpose: Several multichannel potentiostats (Bio Logic VMP3) are available in the laboratory, which are equipped with high standard, impedance, high current, and low current channels. Potentiostats are used for characterizing the electrochemical properties of materials and devices, such as supercapacitors, batteries, and electrocatalytic materials.
Superuser: John, Kyle
Location: Bossone 323
Purpose: Pine Research rotating disk electrode is used for electrochemical catalysis and optical catalysis measurements.
Superuser: Mark, Robert
Model: Thermo Neslab RTE 740
Purpose: Heating and cooling recirculators for applications where precise temperature control over a wide range is required – ex. for probe sonicators to mitigate heating.
Superuser: Mikhail, John
Location: Bossone 323
Purpose: Benchtop test chamber capable of simulating a full range of temperature and humidity conditions with entry ports for in-situ electrochemical measurements.
Superuser: Robert, Benjamin
Options: Two gas adsorption analyzers are available:
Purpose: They are used to measure the surface area and porosity of porous materials
Superuser: Mark, Alex
Location: Bossone 324
Purpose: Simultaneous Thermogravimetric (TG) and Differential Scanning Calorimetry (DSC) equipped with Discovery benchtop quadrupole Mass Spectrometer (MS) allows for investigation of surface chemistry and thermal stability of materials through analysis of weight of the sample and evolved gases upon heating under controlled atmosphere (typically Ar, He, air, and O2)
Superuser: Kateryna, John
Location: Bossone 504
Purpose: Renishaw Raman inverted microscope equipped with 4 laser lines (488 nm, 514 nm, 633 nm and 785 nm) and 4 different objectives (20x, 55x long distance, 63x and 100x), as well as cooling stage (Linkam) which is able to operate in nitrogen atmosphere (77K – 873 K) and BioLogic system for in-situ electrochemistry testing. It is used to analyze vibrational properties of materials.
Superuser: Mikhail, Adam
Location: Bossone 327A
Superuser: Adam, Mark
Location: Bossone 327A
Equipment: Jenco transmission optical microscope is equipped with 10x, 25x and 40x objectives.
Superuser: Geetha, Eliot
Location: Bossone 324
Superuser: Mikhail, Minsoo
Location: Bossone 324
Superuser: Adam, Teng
Location: Bossone 327A
Superuser: Christopher, Adam
Location: Bossone 324
Equipment: Several press systems are available in the laboratory, including Carver 4122 hot press, which is a 12-ton manual hydraulic lab press with digital heated platens.
Superuser: John, Geetha
Location: Bossone 327
Purpose: Automated crimper for coin cells with digital pressure control. Manual unit inside the glovebox
Superuser: Alex, Adam
Location: Bossone 327
Purpose: VTSYIQI AST-S test stand is a hand-pull tension and pressure tester for mechanical characterization.
Superuser: Danzhen, Tetiana
Location: Bossone 327A
Purpose: Infrared Camera used for thermal imaging
Drexel Home
Admissions
Materials Science & Engineering Department
NanoArtography Competition→
DNI 2025 Calendar→
Drexel Univeristy
Materials Science & Engineering
3141 Chestnut Street (LeBow 344)
Philadelphia, PA 19104
U.S.A
A.J. Nanomaterials Institute Office: CAT 383
Nanomaterials Research Lab: Bossone 322 to 327
Prof. Yury Gogotsi – gogotsi@drexel.edu
Jamie Banks (Assistant Director) – jeb23@drexel.edu